Definition
The lithography step in which a developer selectively removes soluble regions of photoresist after exposure, converting the latent image into the physical resist pattern used for later processing.
Application
Used to establish the final resist geometry before etch, implantation or other pattern-transfer steps; positive resist typically removes exposed regions while negative-resist behavior depends on its chemistry, and the developed wafer is rinsed, dried and inspected for pattern quality.
Related search terms
Photoresist development; resist development
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Related concepts
Evidence and further reading
- Evidence from semiconductor.samsung.comhttps://semiconductor.samsung.com/support/tools-resources/fabrication-process/eight-essential-semiconductor-fabrication-processes-part-4-photolithography-laying-the-blueprint/
- Evidence from semiconductor.samsung.comhttps://semiconductor.samsung.com/news-events/tech-blog/a-nano-scale-sketch-on-a-millimeter-scale-wafer-part-1/