Positive Photoresist

05 Lithography & Mask Technology

Definition

Positive photoresist is photoresist in which exposed regions become more soluble in developer and are preferentially removed during development.

Application

Used in photolithography to form a resist image that removes exposed areas and leaves unexposed resist protecting selected wafer regions for subsequent pattern transfer.

Related search terms

Positive resist; Positive-tone photoresist

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Related concepts

Evidence and further reading