Definition
The optical-lithography resolution relationship CD = k1·λ/NA, where CD is printable critical dimension, λ is exposure wavelength, NA is numerical aperture, and k1 is a process-dependent factor.
Application
Used to evaluate lithography resolution scaling: reducing wavelength, increasing numerical aperture, or lowering k1 reduces the printable critical dimension.
Related search terms
Rayleigh resolution criterion
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/rayleigh-criterion
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/lenses-and-mirrors