Definition
The application of a controlled photoresist film to a wafer or substrate, commonly by spin coating and in some processes by spray coating.
Application
Forms the photosensitive film used for subsequent lithographic exposure and patterning; coating conditions are controlled to obtain the required resist thickness and uniformity.
Related search terms
Photoresist coating; Resist coating
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Related concepts
Evidence and further reading
- Evidence from nist.govhttps://www.nist.gov/laboratories/tools-instruments/nanofab-tool-suss-microtec-acs200-automated-resist-coater
- Evidence from imse.washu.eduhttps://imse.washu.edu/facilities/fabrication-techniques.html