Definition
The physical depth of a photoresist coating on a substrate, specified for the processing stage at which it is measured.
Application
Used to select coating conditions and verify photoresist films by optical thickness measurement, mapping, or surface profilometry.
Related search terms
photoresist thickness; resist film thickness
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Related concepts
Evidence and further reading
- Evidence from microchemicals.comhttps://www.microchemicals.com/dokumente/application_notes/spin_coating_photoresist.pdf
- Evidence from filmetrics.comhttps://www.filmetrics.com/products/instruments/thin-film-reflectometers/filmetrics-f20