Definition
The cross-sectional shape of a developed photoresist feature, including its height, width, and sidewall geometry.
Application
Evaluated to control lithographic feature geometry and select resist shapes for pattern transfer, such as undercut profiles for lift-off.
Related search terms
photoresist profile
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Related concepts
Evidence and further reading
- Evidence from tsapps.nist.govhttps://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=823232
- Evidence from microchemicals.comhttps://www.microchemicals.com/dokumente/application_notes/lift_off_photoresist.pdf