Definition
In lithography, the minimum feature size that an exposure system and process can print on a wafer.
Application
Used to assess printable circuit dimensions and guide choices of exposure wavelength, numerical aperture, and lithographic process conditions.
Related search terms
lithographic resolution; lithography resolution
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Related concepts
Evidence and further reading
- Evidence from asml.comhttps://www.asml.com/en/technology/lithography-principles/rayleigh-criterion
- Evidence from global.canonhttps://global.canon/en/technology/canon-tech/tech/semicon/