Ruthenium Interconnect

10 BEOL Interconnect & Metallization

Notation Ru

Definition

On-chip interconnect wiring made with ruthenium, studied as an alternative to copper for aggressively scaled metal layers.

Application

Investigated and demonstrated in advanced logic and memory interconnect development, including directly etched local wiring and buried power rails, to address resistance and RC-delay limits of scaled copper interconnects.

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Related concepts

Evidence and further reading

  • Evidence from imec-int.comhttps://www.imec-int.com/en/press/imec-demonstrates-16nm-pitch-ru-lines-record-low-resistance-obtained-using-semi-damascene
  • Evidence from imec-int.comhttps://www.imec-int.com/en/articles/imec-reports-breakthrough-in-extending-interconnects-beyond-the-3nm-technology-node