Definition
A random failure of lithographic pattern formation arising from statistical fluctuations in exposure or resist processes.
Application
Characterized in EUV resist and process development to reduce failures such as bridged or broken lines and missing contacts.
Related concepts
Evidence and further reading
- Evidence from imec-int.comhttps://www.imec-int.com/en/imec-magazine/imec-magazine-july-2019/euv-lithography-sailing-along-the-stochastic-cliffs
- Evidence from research.ibm.comhttps://research.ibm.com/publications/contribution-of-euv-resist-counting-statistics-to-stochastic-printing-failures